A 50-mm diameter single crystalline silicon wafer was used as the

A 50-mm diameter single crystalline silicon wafer was used as the target material and rotated/translated to avoid the formation of deep pits during ablation. The first set of experiments to analyse particle size was conducted by ablating the Si target for a short 2-min deposition time and collecting the ablated

material onto a transmission electron microscopy (TEM) grid, which could buy OSI-027 then be analysed using a Phillips FEI Technai TF20 field emission gun TEM (Hillsboro, OR, USA) operating at a gun voltage of 200 kV. These samples were analysed by taking a series of images of different areas of the grids and measuring each particle diameter. The results are presented here as histograms for depositions made at 20, 40 and 60 mTorr as well as some accompanying TEM micrographs. Following this, thin films were grown on fused silica substrates over a time period of 2 h in Ar or 4% H in Ar background gas in the range of 20 to 70 mTorr. The substrate was positioned 70 mm away from the target material and was rotated at a constant 20 BTSA1 molecular weight rpm during the fabrication.

These thin films were characterised by scanning electron microscopy (SEM) and Raman microscopy. These were done to carry out optical, electronic and structural analysis of the films to better define parameters for growing a film for optical applications and high-quality device fabrication. Results and discussion Sub-monolayer deposition Figure 1a shows the exponential decay fit to the histogram of each background pressure, in good statistical agreement to the data itself. The fit has been limited to 6 nm diameters and above for particles deposited at 20 mTorr and 4 nm and above for 40 and 60 mTorr. This is because below this diameter, the resolution and contrast ratio of the particles with respect to the copper grid are too low for an accurate assessment of particle size. These results are in good agreement with observations by Amoruso et al. [10] in vacuum, where a similar exponential character was identified for the relative yield of particle sizes. Importantly, this

is an indicator of the large abundance of silicon nanoparticles below the exciton Bohr radius and can therefore be considered as quantum dots. Figure 1 TEM particle size Protein kinase N1 analysis. (a) Particle diameter histograms for samples deposited at 20, 40 and 60 mTorr with exponential decay fits (b) TEM micrograph of particles deposted at 20 mTorr in 4% H in Ar. For the KPT-8602 in vitro growth of continuous thin films, fabricated by fs-PLD, it is necessary to include some sort of background gas to widen the plasma plume and therefore evenly deposit over a substrate surface. Without a background gas, the plasma plume will be very narrow and thus form a very uneven film surface from one side to the other, where the majority of deposits will be made in the very centre [11]. A background gas decreases the kinetic energy of the ablated particles and causes gradual changes in their trajectory with subsequent collisions.

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